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NANOIMPRINT FABRICATION OF WIRE-GRID POLARIZERS USING DEEP-UV INTERFERENCE LITHOGRAPHY.pdf (4.57 MB)
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Nanoimprint Fabrication of Wire-grid Polarizers Using Deep-UV Interference Lithography
Author Info
Wang, Junxin
Permalink:
http://rave.ohiolink.edu/etdc/view?acc_num=dayton1406913848
Abstract Details
Year and Degree
2014, Master of Science (M.S.), University of Dayton, Electro-Optics.
Abstract
Wire-grid polarizers in the visible and near-IR spectra have a number of interesting applications in imaging because they can be made in pixel-sizes and at different orientations. They are most easily fabricated by lift-off lithography, but this reduces the wire thickness resulting in low aspect ratios and the poor polarizer extinction ratios. Alternative methods such as the damascene process have also proven to be difficult. In this thesis, we demonstrate a nanoimprint technique where a polymer film on glass is used as the substrate for imprinting the grooves, followed by metallization. A high resolution 220nm periodic stamp, with feature sizes of the order of 100nm, is fabricated on silicon using deep-UV (266nm) interference lithography and directional plasma etching. The interference lithography process was developed and optimized for the fabrication of these nanostructures. This nanostructure is transferred onto a patternable epoxy (SU-8) using vacuum thermo-compression and in-situ UV exposure. SU-8 was chosen because it is optically clear and easily imprinted. A new in-situ UV illumination system was designed and built for the imprint. The imprinted structure also enables a unique glancing angle deposition method that is much easier for the fabrication of wire grids than lift-off or damascene. A polarizer extinction ratio of 90 was measured at 1064nm wavelength. In this thesis we will show the results from these processes, including process details, SEM images and performance data.
Committee
Andrew Sarangan (Committee Chair)
Imad Agha (Committee Member)
Jay Mathews (Committee Member)
Subject Headings
Nanotechnology
;
Optics
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Citations
Wang, J. (2014).
Nanoimprint Fabrication of Wire-grid Polarizers Using Deep-UV Interference Lithography
[Master's thesis, University of Dayton]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1406913848
APA Style (7th edition)
Wang, Junxin.
Nanoimprint Fabrication of Wire-grid Polarizers Using Deep-UV Interference Lithography.
2014. University of Dayton, Master's thesis.
OhioLINK Electronic Theses and Dissertations Center
, http://rave.ohiolink.edu/etdc/view?acc_num=dayton1406913848.
MLA Style (8th edition)
Wang, Junxin. "Nanoimprint Fabrication of Wire-grid Polarizers Using Deep-UV Interference Lithography." Master's thesis, University of Dayton, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1406913848
Chicago Manual of Style (17th edition)
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Document number:
dayton1406913848
Download Count:
2,436
Copyright Info
© 2014, all rights reserved.
This open access ETD is published by University of Dayton and OhioLINK.