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Thesis gongxu bai__final format approved LW 12-10-2021.pdf (3.18 MB)
ETD Abstract Container
Abstract Header
Numerical Modeling of Photoresist Profiles in Laser Interference Lithography
Author Info
Bai, Gongxu
ORCID® Identifier
http://orcid.org/0000-0002-7323-7354
Permalink:
http://rave.ohiolink.edu/etdc/view?acc_num=dayton1639486051272697
Abstract Details
Year and Degree
2021, Master of Science (M.S.), University of Dayton, Electro-Optics.
Abstract
Photolithography (or optical lithography) is a technique that produces structures in the lateral direction by performing a series of light-induced chemical changes in the photoresist. The most common photolithography process requires a photomask to produce the exposure. The desired geometric pattern is printed on the photomask as transparent and opaque areas. The pattern on the photomask is projected onto the photoresist, either by physical contact or through imaging optics. Although the basic principle of optical lithography is simple, producing features smaller than 100 nanometers is nontrivial. In this thesis we are mainly discussing laser interference lithography, which is an alternate method for producing extremely fine features on a large area. Laser interference lithography uses both the phase and amplitude of light, whereas photomask lithography relies on intensity only. Laser interference lithography is ideally suited for producing periodic patterns. In this thesis, the photoresist exposure and development process in laser interference lithography is numerically modelled. Models were implemented to simulate the relationships between optical intensity, photoresist DNQ concentration, solubility, develop time and the photoresist structural profiles. Finally, the conclusions are compared with previously obtained the experimental results.
Committee
Andrew Sarangan (Advisor)
Andrew Sarangan (Committee Chair)
Partha Banerjee (Committee Member)
Swapnajit Chakravarty (Committee Member)
Pages
72 p.
Subject Headings
Nanotechnology
;
Optics
Keywords
"laser interference lithography
;
photoresist
;
numerical modeling
;
lithography"
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Citations
Bai, G. (2021).
Numerical Modeling of Photoresist Profiles in Laser Interference Lithography
[Master's thesis, University of Dayton]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1639486051272697
APA Style (7th edition)
Bai, Gongxu.
Numerical Modeling of Photoresist Profiles in Laser Interference Lithography.
2021. University of Dayton, Master's thesis.
OhioLINK Electronic Theses and Dissertations Center
, http://rave.ohiolink.edu/etdc/view?acc_num=dayton1639486051272697.
MLA Style (8th edition)
Bai, Gongxu. "Numerical Modeling of Photoresist Profiles in Laser Interference Lithography." Master's thesis, University of Dayton, 2021. http://rave.ohiolink.edu/etdc/view?acc_num=dayton1639486051272697
Chicago Manual of Style (17th edition)
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Document number:
dayton1639486051272697
Download Count:
457
Copyright Info
© 2021, all rights reserved.
This open access ETD is published by University of Dayton and OhioLINK.