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Plasma enhanced chemical vapor deposition of thin aluminum oxide films

Miller, Larry M.
http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175717717

Abstract Details

1993, Master of Science (MS), Ohio University, Chemical Engineering (Engineering).

Plasma enhanced chemical vapor deposition of thin aluminum oxide films

Dan Gulino (Advisor)
47 p.
Engineering, Chemical
Plasma; Chemical vapor deposition; Thin aluminum oxide films

Recommended Citations

Citations

  • Miller, L. M. (1993). Plasma enhanced chemical vapor deposition of thin aluminum oxide films [Master's thesis, Ohio University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175717717

    APA Style (7th edition)

  • Miller, Larry. Plasma enhanced chemical vapor deposition of thin aluminum oxide films. 1993. Ohio University, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175717717.

    MLA Style (8th edition)

  • Miller, Larry. "Plasma enhanced chemical vapor deposition of thin aluminum oxide films." Master's thesis, Ohio University, 1993. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1175717717

    Chicago Manual of Style (17th edition)

ohiou1175717717
884
© 1993, all rights reserved.
This open access ETD is published by Ohio University and OhioLINK.