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ohiou1183727670.pdf (2.87 MB)
ETD Abstract Container
Abstract Header
Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si
x
N
y
) thin films
Author Info
Gladysz, Gary M.
Permalink:
http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670
Abstract Details
Year and Degree
1991, Master of Science (MS), Ohio University, Chemical Engineering (Engineering).
Abstract
Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si
x
N
y
) thin films
Committee
Daniel Gulino (Advisor)
Pages
56 p.
Subject Headings
Engineering, Chemical
Keywords
Remote Microwave-Enhanced Chemical
;
Vapor Deposition
;
Silicon-nitrogen (Si
x
N
y
) Thin Films
Recommended Citations
Refworks
EndNote
RIS
Mendeley
Citations
Gladysz, G. M. (1991).
Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si
x
N
y
) thin films
[Master's thesis, Ohio University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670
APA Style (7th edition)
Gladysz, Gary.
Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si
x
N
y
) thin films.
1991. Ohio University, Master's thesis.
OhioLINK Electronic Theses and Dissertations Center
, http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670.
MLA Style (8th edition)
Gladysz, Gary. "Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si
x
N
y
) thin films." Master's thesis, Ohio University, 1991. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670
Chicago Manual of Style (17th edition)
Abstract Footer
Document number:
ohiou1183727670
Download Count:
518
Copyright Info
© 1991, all rights reserved.
This open access ETD is published by Ohio University and OhioLINK.