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Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si xN y) thin films

Gladysz, Gary M.

Abstract Details

1991, Master of Science (MS), Ohio University, Chemical Engineering (Engineering).
Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si xN y) thin films
Daniel Gulino (Advisor)
56 p.

Recommended Citations

Citations

  • Gladysz, G. M. (1991). Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si xN y) thin films [Master's thesis, Ohio University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670

    APA Style (7th edition)

  • Gladysz, Gary. Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si xN y) thin films. 1991. Ohio University, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670.

    MLA Style (8th edition)

  • Gladysz, Gary. "Remote microwave-enhanced chemical vapor deposition of silicon-nitrogen (Si xN y) thin films." Master's thesis, Ohio University, 1991. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1183727670

    Chicago Manual of Style (17th edition)