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Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition

Carbaugh, Daniel J.

Abstract Details

2014, Master of Science (MS), Ohio University, Electrical Engineering (Engineering and Technology).
Plasma Enhanced Chemical Vapor Deposition (PECVD) is widely used in industry for its low temperature growth capability, excellent conformity (step coverage) and higher deposition rates. Silicon dioxide (SiO2), silicon nitride (Si3N4) and silicon oxynitride (SiOxNy) are common dielectrics deposited using PECVD and they will be the main focus of this thesis. These common dielectrics are used in a range of different applications, from optical waveguides to photovoltaic passivation layers and from transistor fabrication to micro electromechanical systems (MEMS) devices. PECVD system parameters (temperature, pressure, power, and gas ratio) are methodically varied and the resulting thin films are characterized. This requires many different metrology techniques such as: atomic force microscopy (AFM), ellipsometry, X-ray diffraction (XRD) and energy dispersive X-ray spectroscopy (EDS). Optical and structural properties of the resulting thin films are analyzed via a careful design of experiments to determine which system parameter has the most significant effect and to which extent they can be varied.
Savas Kaya, Ph.D (Advisor)
Faiz Rahman, Ph.D (Committee Member)
Wojciech Jadwisienczak, Ph.D (Committee Member)
David Drabold, Ph.D (Committee Member)
118 p.

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Citations

  • Carbaugh, D. J. (2014). Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition [Master's thesis, Ohio University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1406644891

    APA Style (7th edition)

  • Carbaugh, Daniel. Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition. 2014. Ohio University, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1406644891.

    MLA Style (8th edition)

  • Carbaugh, Daniel. "Growth and Characterization of Silicon-Based Dielectrics using Plasma Enhanced Chemical Vapor Deposition." Master's thesis, Ohio University, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=ohiou1406644891

    Chicago Manual of Style (17th edition)