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Low Frequency Noise Characterization of AlGaN GaN High Electron Mobility Transistors-Ningjiao Zhang.pdf (1.49 MB)
ETD Abstract Container
Abstract Header
Low Frequency Noise Characterization of AlGaN/GaN High Electron Mobility Transistors
Author Info
Zhang, Ningjiao
Permalink:
http://rave.ohiolink.edu/etdc/view?acc_num=osu1366369049
Abstract Details
Year and Degree
2013, Master of Science, Ohio State University, Electrical and Computer Engineering.
Abstract
Low frequency noise performance is an important aspect of semiconductor transistors evaluation. It is also a macroscopical method of defect spectroscopy. Characterization of low frequency noise performance at different bias conditions can help to locate defects of the devices together with other materials and device characterization techniques. In this work, low frequency noise of non-passivated and passivated AlGaN/GaN high electron mobility transistors (HEMTs) at different bias conditions are carefully measured and studied. By studying band-diagram, defects locations and time constant of the devices, comparing and analyzing meausurement results, we have the following major findings: (1) At the subthreshold region, surface defects trapping and detrapping process dominates the low frequency noise for non-passivated devices while process of defects in AlGaN layer dominates for passivated devices; (2) Contributions of defects at different locations including surface, AlGaN layer, and GaN layer with different time constants have large impact on the frequency exponent of noise power density spectrum based on drain bias low frequency noise spectra; (3) By doing gate bias dependent measurement and related fitting, the results show that carrier number flucuation dominates at small gate bias (near pinch-off) and mobility flucuation becomes more and more dominant as gate bias increases. If the gate bias is large enough that both channel resistance and noise induced by channel resistance are negligible compared to the access region ressistance, low frequency noise power density is independent of gate bias.
Committee
Wu Lu (Advisor)
Siddharth Rajan (Committee Member)
Pages
57 p.
Subject Headings
Electrical Engineering
;
Materials Science
;
Solid State Physics
Keywords
low frequency noise
;
GaN
;
defects
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EndNote
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Citations
Zhang, N. (2013).
Low Frequency Noise Characterization of AlGaN/GaN High Electron Mobility Transistors
[Master's thesis, Ohio State University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=osu1366369049
APA Style (7th edition)
Zhang, Ningjiao.
Low Frequency Noise Characterization of AlGaN/GaN High Electron Mobility Transistors.
2013. Ohio State University, Master's thesis.
OhioLINK Electronic Theses and Dissertations Center
, http://rave.ohiolink.edu/etdc/view?acc_num=osu1366369049.
MLA Style (8th edition)
Zhang, Ningjiao. "Low Frequency Noise Characterization of AlGaN/GaN High Electron Mobility Transistors." Master's thesis, Ohio State University, 2013. http://rave.ohiolink.edu/etdc/view?acc_num=osu1366369049
Chicago Manual of Style (17th edition)
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Document number:
osu1366369049
Download Count:
2,029
Copyright Info
© 2013, all rights reserved.
This open access ETD is published by The Ohio State University and OhioLINK.