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Synthesis of Functional Multilayer Coatings by Plasma Enhanced Chemical Vapor Deposition

Xiao, Zhigang
http://rave.ohiolink.edu/etdc/view?acc_num=ucin1081456822

Abstract Details

2004, PhD, University of Cincinnati, Engineering : Electrical Engineering.
Silicon dioxide, silicon-containing polymer, silicon nitride, metal nitride, and germanium thin films were grown by electron cyclotron resonance (ECR) microwave plasma enhanced chemical vapor deposition (PECVD), and multilayer coatings were grown for high hardness and high corrosion resistance. Silicon dioxide was grown from hexamethyldisiloxane (HMDSO), 1,3,5,7-tetramethylcyclotetrasiloxane (TOMCTS ), and octamethylcyclotetrasiloxance (OMCTS) in a oxygen plasma. The grown silicon dioxide thin films were hard and colorless. Silicon nitride was grown from hexamethyldisiloxane (HMDSO) and tetramethylsilane (TMS) in an ammonia (NH3) plasma. The silicon nitride thin films grown from HMDSO were hard and transparent while the silicon nitride thin films grown from TMS were black and hard. Silicon-containing polymer was grown from 100% OMCTS. The polymer thin films are colorless, had relatively low hardness and very good salt-fog corrosion resistance. Titanium nitride, zirconium nitride, and chromium nitride were grown from titanium (IV) isopropoxide and tetrakis(dimethylamino)titanium, zirconium 2-methyl-2-butoxide and zirconium t-butoxide, and bis(ethylbenzene)chromium in an ammonia plasma. The grown titanium nitride and zirconium nitride thin films had characteristic gold coloring and high hardness while the grown chromium nitride thin films were black gray and had high hardness. Germanium thin films were grown from tetramethylgermane (TMG) in a argon plasma. The deposited germanium films were uniform and had polished-like shining surface. X-ray photoelectron spectroscopic (XPS) analyses showed the films contained 97 % germanium atomic concentration with less than 1 % carbon, and X-ray diffraction (XRD) analyses showed the films had the crystal structure of <220>. Hard corrosion-resistant silicon-containing multilayer coatings were grown in a high-density microwave electron cyclotron resonance discharge. The multilayer coatings consist of a relatively soft silicon-containing polymer thin film as the bottom layer and a hard silicon dioxide or silicon nitride thin film as the top layer. Silicon-containing polymer thin films were grown from 100% OMCTS. Silicon dioxide and silicon nitride thin films were grown from OMCTS with O2 and HMDSO with NH3, respectively. The multilayer structures combined high surface hardnesses with good corrosion resistance, surviving 1800 to 2600 hours in an ASTM B117 salt-fog corrosion test. Multilayer coatings with a titanium nitride or zirconium nitride bottom layer and a transparent silicon-containing polymer or silicon dioxide top layer were grown in a high-density microwave electron cyclotron resonance discharge for protective or decorative coating application. The grown multilayer coatings had gold coloring and good film thickness.
Dr. Thomas Mantei (Advisor)
159 p.
PECVD; ECR; Multilayer Coating; Silicon Dioxide; Silicon Nitride; Silicon-Containing Polymer; TiN Thin Film; ZrN Thin Films; CrN Thin Films; Ge Thin Film; ASTM B117; and DLI

Recommended Citations

Citations

  • Xiao, Z. (2004). Synthesis of Functional Multilayer Coatings by Plasma Enhanced Chemical Vapor Deposition [Doctoral dissertation, University of Cincinnati]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1081456822

    APA Style (7th edition)

  • Xiao, Zhigang. Synthesis of Functional Multilayer Coatings by Plasma Enhanced Chemical Vapor Deposition. 2004. University of Cincinnati, Doctoral dissertation. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ucin1081456822.

    MLA Style (8th edition)

  • Xiao, Zhigang. "Synthesis of Functional Multilayer Coatings by Plasma Enhanced Chemical Vapor Deposition." Doctoral dissertation, University of Cincinnati, 2004. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1081456822

    Chicago Manual of Style (17th edition)

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This open access ETD is published by University of Cincinnati and OhioLINK.