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Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists

Cole, Robert Lawrence
http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859

Abstract Details

2004, MS, University of Cincinnati, Engineering : Electrical Engineering.
This work presents development and establishment of excimer laser ablation microlithography for processing difficult cylindrical substrates. Preliminary excimer laser ablation microlithography work was performed on glass planar substrates with thick photoresist over a thin metal layer. Laser system parameters were investigated and optimized for patterning thick photoresist without damaging the underlying thin metal layer. Metallic microstructures were realized by electroplating through the laser ablation patterned thick photoresist mold and onto the thin seed metal layer. Cylindrical substrate processing capability was accomplished by adding and optimizing the following equipment: dip coating module, horizontal axis rotation unit for electron-beam evaporation metallization, high precision lathe, and modified electroplating system. Electroplated metallic microstructures were successfully realized onto cylindrical substrates after patterning thick photoresist with a precision lathe and by excimer laser ablation. The excimer laser ablation microlithography developed and established in this work will provide researchers with new capabilities to fabricate metallic microstructures for novel microdevices on cylindrical substrates.
Dr. Chong Ahn (Advisor)
55 p.
Excimer Laser Ablation Lithography Cylindrical Microfabrication

Recommended Citations

Citations

  • Cole, R. L. (2004). Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists [Master's thesis, University of Cincinnati]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859

    APA Style (7th edition)

  • Cole, Robert. Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists. 2004. University of Cincinnati, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859.

    MLA Style (8th edition)

  • Cole, Robert. "Precision Excimer Laser Lithography for Cylindrical Substrates With Thick Photoresists." Master's thesis, University of Cincinnati, 2004. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1093033859

    Chicago Manual of Style (17th edition)

ucin1093033859
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© 2004, all rights reserved.
This open access ETD is published by University of Cincinnati and OhioLINK.