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Magnetron Sputtered Substrates for Scaled-up Manufacturing of Carbon Nanotubes and their Plasma Functionalization

Salunke, Pravahan Shamkant
http://rave.ohiolink.edu/etdc/view?acc_num=ucin1247682554

Abstract Details

2009, MS, University of Cincinnati, Engineering : Materials Science.
In this study we explored the use of alternative techniques for substrate preparation for CNT synthesis and for post-synthesis functionalization of the CNTs. Magnetron sputtering was exploited as an alternative to e-beam deposition for preparation of the alumina intermediate layer and of the metal catalyst on an oxidized Si wafer. This approach offers large area deposition (4 inch substrates) of the layered catalyst which precedes the fabrication of larger aligned CNT arrays. The effects of the substrate design on the growth of long multi-wall carbon nanotube (MWCNT) arrays by CVD (Chemical Vapor Deposition) were also explored. The CNT synthesis was carried on in a hydrogen/ethylene/water/argon environment at 750 °C. Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD), Thermal Gravimetric Analysis (TGA), Raman Spectroscopy and Transmission Electron Microscopy (TEM) were employed to characterize the substrates and the CNT arrays. The study showed that for specific processing conditions the length of highly oriented CNTs strongly depends on the thickness of Al2O3 intermediate layer and on the catalyst film. The obtained results confirm that magnetron sputtering can be successfully employed as a tool for substrate preparation, which were used to grow CNT arrays upto 12 mm in length with high purity. The aligned nanotubes do not suffer from limitations typical for powdered (spaghetti type nanotubes) which opens up the possibilities of new applicationsFunctionalization can be described as a process in which the CNTs are modified in order to enhance their properties. The dry plasma treatment was chosen over the conventional wet chemical functionalization because it is quicker and more convenient. The effect of plasma functionalization on the MWCNTs was studied with the Fourier Transfer Infra-Red spectroscopy.
Vesselin Shanov, PhD (Advisor)
Mark Schulz, PhD (Committee Member)
Rodney Roseman, PhD (Committee Member)
Jude Iroh, PhD (Committee Member)
143 p.
Materials Science
Magnetron Sputtering; CVD; Chemical Vapor Deposition; Carbon Nanotubes; Plasma Functionalization; FTIR

Recommended Citations

Citations

  • Salunke, P. S. (2009). Magnetron Sputtered Substrates for Scaled-up Manufacturing of Carbon Nanotubes and their Plasma Functionalization [Master's thesis, University of Cincinnati]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1247682554

    APA Style (7th edition)

  • Salunke, Pravahan. Magnetron Sputtered Substrates for Scaled-up Manufacturing of Carbon Nanotubes and their Plasma Functionalization. 2009. University of Cincinnati, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=ucin1247682554.

    MLA Style (8th edition)

  • Salunke, Pravahan. "Magnetron Sputtered Substrates for Scaled-up Manufacturing of Carbon Nanotubes and their Plasma Functionalization." Master's thesis, University of Cincinnati, 2009. http://rave.ohiolink.edu/etdc/view?acc_num=ucin1247682554

    Chicago Manual of Style (17th edition)

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© 2009, all rights reserved.
This open access ETD is published by University of Cincinnati and OhioLINK.