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Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering

Reed, Amber Nicole

Abstract Details

2008, Master of Science (MS), Wright State University, Physics.
In this work, the effects of a post-deposition RF plasma treatment on indium tin oxide (ITO) thin films prepared with pulsed DC magnetron sputtering in argon were investigated. The parameters of the post-deposition were studied to determine what RF power and gas pressure resulted in the greatest reduction in resistivity in the films while producing the smallest increase in substrate temperature for treatments with both argon and oxygen plasmas. The as-deposited (untreated) films and the treated films were characterized using Raman spectroscopy and X-ray diffraction to determine the effects of the post-deposition treatment on the degree of film crystallization. XPS was used to analyze the chemical composition of the films’ surface. SEM images were taken to observe surface features of the films. The resistivity of the films reached 1.66 * 10-5 Ω m as-deposited and 6.74*10-6 Ω m after treatment.
Douglas T. Petkie, Ph.D. (Advisor)
Douglas T Petkie, Ph.D. (Committee Chair)
John G. Jones, Ph.D. (Committee Member)
Jason A. Deibel, Ph.D. (Committee Member)
57 p.

Recommended Citations

Citations

  • Reed, A. N. (2008). Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering [Master's thesis, Wright State University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086

    APA Style (7th edition)

  • Reed, Amber. Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering. 2008. Wright State University, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086.

    MLA Style (8th edition)

  • Reed, Amber. "Characterization of Inert Gas RF Plasma-Treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering." Master's thesis, Wright State University, 2008. http://rave.ohiolink.edu/etdc/view?acc_num=wright1221763086

    Chicago Manual of Style (17th edition)