Skip to Main Content
Frequently Asked Questions
Submit an ETD
Global Search Box
Need Help?
Keyword Search
Participating Institutions
Advanced Search
School Logo
Files
File List
Jason_Final_Thesis_Ohiolink.pdf (2.5 MB)
ETD Abstract Container
Abstract Header
Thin Film Growth of Dielectric Materials by Pulsed Laser Deposition
Author Info
Anders, Jason Christopher
ORCID® Identifier
http://orcid.org/0000-0001-9930-7456
Permalink:
http://rave.ohiolink.edu/etdc/view?acc_num=wright1401681886
Abstract Details
Year and Degree
2014, Master of Science (MS), Wright State University, Physics.
Abstract
Thin films of Sr
y
Ca
1-y
Zr
1-x
Ti
x
O
3
(SCZT) with x = 0.8, y = 0.01, CaHf
1-x
Ti
x
O
3
(CHT) with x = 0.8, and
x
BiScO
3
- (1-x) BaTiO
3
with x = 0.36 (BSBT(36/64)) showing a high permittivity are useful both in capacitor applications. These dielectric thin films with a SrRuO
3
(SRO) conductive bottom electrodes were prepared by using pulsed laser deposition on <100> La
0.3
Sr
0.7
Al
0.65
Ta
0.35
O
3
(LSAT) single crystal substrates. In a search of optimal conditions to achieve epitaxially grown SCZT, CHT, BSBT(36/64), and SRO thin films, different substrate temperatures (600 C, 650 C, 750 C, and 800 C) and different partial pressures of oxygen (50 mTorr, 100 mTorr and 300 mTorr) in the chamber were used during deposition onto LSAT substrates. The optimized deposition conditions for conductive buffer layer of SRO film required 300 mTorr of oxygen partial pressure and substrate temperature of 750 C. The thorough structural and chemical studies of SCZT, CHT and BSBT(36/64) films were done by using SEM (scanning electron microscopy), AFM (atomic force microscopy), and XRD (X-ray diffraction) measurements. Sputtered gold top electrodes were added to the samples, along with etching to the SRO conductive buffer layer. These conductive electrodes were used to generate an AC electric field between the top electrodes and conductive buffer layer. Electrical characterizations of thin films such as complex permittivity, resistance and capacitance of grains and grain boundaries were performed using AC impedance spectroscopy, with curve fitting using Z-View software.
Committee
Gregory Kozlowski, Ph.D. (Advisor)
Doug Petkie, Ph.D. (Committee Member)
Charles Stutz, Ph.D. (Committee Member)
Pages
81 p.
Subject Headings
Physics
Keywords
pulsed laser deposition
Recommended Citations
Refworks
EndNote
RIS
Mendeley
Citations
Anders, J. C. (2014).
Thin Film Growth of Dielectric Materials by Pulsed Laser Deposition
[Master's thesis, Wright State University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=wright1401681886
APA Style (7th edition)
Anders, Jason.
Thin Film Growth of Dielectric Materials by Pulsed Laser Deposition.
2014. Wright State University, Master's thesis.
OhioLINK Electronic Theses and Dissertations Center
, http://rave.ohiolink.edu/etdc/view?acc_num=wright1401681886.
MLA Style (8th edition)
Anders, Jason. "Thin Film Growth of Dielectric Materials by Pulsed Laser Deposition." Master's thesis, Wright State University, 2014. http://rave.ohiolink.edu/etdc/view?acc_num=wright1401681886
Chicago Manual of Style (17th edition)
Abstract Footer
Document number:
wright1401681886
Download Count:
836
Copyright Info
© 2014, all rights reserved.
This open access ETD is published by Wright State University and OhioLINK.