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Formation of Surface Features in Boron-Doped Silicon (100) in the Presence of Propan-2-OL

Withanage, Sajeevi Sankalpani
http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676

Abstract Details

2015, Master of Science, University of Akron, Physics.
Silicon is the most commonly used material for semiconductor device fabrication. Atomic force microscope/microscopy (AFM)-based nanolithography is a technique used in nanofabrication. Techniques discussed in relation to this work include local anodic oxidation (LAO), Atomic Force Microscopy assisted Electrostatic Nanolithography (AFMEN), which have been studied for years and proven to be very flexible fabrication tools. In this study, we report the possibility of patterning nanostructures on silicon without external bias. Samples we have used in the study were HF passivated boron doped Si (100) wafers treated with propan-2-ol. Amplitude Modulated AFMEN (without bias voltage) has been selected for patterning the nanostructures in silicon. The tip was isolated from the carrier to prevent grounding and stray currents. Using the C++ codes, we were able to create raised nanostructures on the surface with the height ranging 2-25 nm under ambient conditions. Mechanism and theory of the formation of features is still under investigation. Furthermore, we present three hypotheses to explain feature formation: 1) effects due to boron defects on the surface, 2) electrification of the surface due to friction (triboelectrification), and 3) electrochemical nanocell formation modified in the presence of propan-2-ol.
Sergei Lyuksyutov, Dr. (Advisor)
Sasa Dordevic, Dr. (Committee Member)
Robert Mallik, Dr. (Committee Member)
57 p.
Physics
Silicon, Nanolithography

Recommended Citations

Citations

  • Withanage, S. S. (2015). Formation of Surface Features in Boron-Doped Silicon (100) in the Presence of Propan-2-OL [Master's thesis, University of Akron]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676

    APA Style (7th edition)

  • Withanage, Sajeevi. Formation of Surface Features in Boron-Doped Silicon (100) in the Presence of Propan-2-OL . 2015. University of Akron, Master's thesis. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676.

    MLA Style (8th edition)

  • Withanage, Sajeevi. "Formation of Surface Features in Boron-Doped Silicon (100) in the Presence of Propan-2-OL ." Master's thesis, University of Akron, 2015. http://rave.ohiolink.edu/etdc/view?acc_num=akron1433770676

    Chicago Manual of Style (17th edition)

akron1433770676
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This open access ETD is published by University of Akron and OhioLINK.