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Low-energy sputtering of Teflon by oxygen ion bombardment

Lamouri, Abbas

Abstract Details

1991, Doctor of Philosophy, Case Western Reserve University, Physics.
The interaction of low energy oxygen ions (12 to 185 eV) with Teflon surfaces has been investigated using both continuous and pulsed ion bombardment. A quadrupole mass spectrometer detected particles produced by this bombardment. Strong signals were observed at 31, 50, and 69 amu, which are attributed to CF, CF2, and CF3 molecules. The data support the conclusion that these molecules are not the direct products of the ion bombardment. Fluorine and carbon atoms are assumed to be the direct products, sputtered with such high velocities that the efficiency for their detection by the mass spectrometer is low. The CF, CF2, and CF3 data obtained with continuous ion bombardment are used to deduce sputter yields (equivalent CF2 units removed per incident ion). These yields increase from 0.013 at 12eV to 0.17 at 185 eV.
R. Hoffman (Advisor)
88 p.

Recommended Citations

Citations

  • Lamouri, A. (1991). Low-energy sputtering of Teflon by oxygen ion bombardment [Doctoral dissertation, Case Western Reserve University]. OhioLINK Electronic Theses and Dissertations Center. http://rave.ohiolink.edu/etdc/view?acc_num=case1055777824

    APA Style (7th edition)

  • Lamouri, Abbas. Low-energy sputtering of Teflon by oxygen ion bombardment. 1991. Case Western Reserve University, Doctoral dissertation. OhioLINK Electronic Theses and Dissertations Center, http://rave.ohiolink.edu/etdc/view?acc_num=case1055777824.

    MLA Style (8th edition)

  • Lamouri, Abbas. "Low-energy sputtering of Teflon by oxygen ion bombardment." Doctoral dissertation, Case Western Reserve University, 1991. http://rave.ohiolink.edu/etdc/view?acc_num=case1055777824

    Chicago Manual of Style (17th edition)